Vertical Sputtering Device LLS EVO II
Flexibility, compact design, and low investment costs! An ideal choice for small-scale production.
The "LLS EVO II" is a versatile batch sputtering system with a vertical and dynamic concept, capable of accommodating up to five different materials, and features a device that separates the substrate load chamber and process chamber (LC, PC). It supports various substrate sizes and shapes up to 200×230mm. It can be equipped with configurable power supplies to enhance process flexibility. The degassing and etching of substrates in the load chamber ensure high-purity processes in the process chamber, allowing for easy conversion to various substrate sizes in under five minutes, making it a flexible manufacturing device. 【Features (partial)】 ■ Up to five sputter sources with DC, DC pulse, RF, and RF/DC ■ Simultaneous sputtering from up to three cathodes ■ Reactive sputtering with oxygen and nitrogen ■ High vacuum system configuration with turbo pump, cryo pump, and water trap *For more details, please refer to the related links or feel free to contact us.
- Company：日本エバテック
- Price：Other
